Use of ALD thin film bragg mirror stacks in tuneable visible light mems fabry-perot interferometers

Anna Rissanen*, Riikka L. Puurunen

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

8 Citations (Scopus)

Abstract

This paper discusses the use of ALD thin films as Bragg mirror structure materials in MEMS Fabry-Perot interferometers in the visible spectral range. Utilizing polyimide sacrificial layer in the FPI fabrication process is also presented as an alternative method to allow higher temperature (T= 300 °C) ALD FPI processing. ALD Al2O 3 and TiO 2 thin films grown at T= 110 °C are optically characterized to determine their performance in the UV - visible range (λ>200nm) and effects of the ALD temperature on the thin film stacks and the FPI process is discussed. Optically simulated 5-layer Bragg mirror stacks consisting of ALD Al2O 3 and TiO 2 for wavelengths between 420 nm and 1000 nm are presented and corresponding MEMS mirror membrane structures are fabricated at T= 110 °C and tested for their release yield properties. As a result, the applicable wavelength range of the low-temperature ALD FPI technology can be defined.

Original languageEnglish
Title of host publicationAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Volume8249
DOIs
Publication statusPublished - 2012
MoE publication typeA4 Article in a conference publication
EventAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics - San Francisco, United States
Duration: 24 Jan 201225 Jan 2012
Conference number: 5

Conference

ConferenceAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics
CountryUnited States
CitySan Francisco
Period24/01/201225/01/2012

Keywords

  • Atomic layer deposition
  • Bragg mirror
  • Fabry-perot interferometer
  • Mems
  • Spectrometry

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