Abstract
This paper discusses the use of ALD thin films as Bragg mirror structure materials in MEMS Fabry-Perot interferometers in the visible spectral range. Utilizing polyimide sacrificial layer in the FPI fabrication process is also presented as an alternative method to allow higher temperature (T= 300 °C) ALD FPI processing. ALD Al2O 3 and TiO 2 thin films grown at T= 110 °C are optically characterized to determine their performance in the UV - visible range (λ>200nm) and effects of the ALD temperature on the thin film stacks and the FPI process is discussed. Optically simulated 5-layer Bragg mirror stacks consisting of ALD Al2O 3 and TiO 2 for wavelengths between 420 nm and 1000 nm are presented and corresponding MEMS mirror membrane structures are fabricated at T= 110 °C and tested for their release yield properties. As a result, the applicable wavelength range of the low-temperature ALD FPI technology can be defined.
| Original language | English |
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| Title of host publication | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V |
| Volume | 8249 |
| DOIs | |
| Publication status | Published - 2012 |
| MoE publication type | A4 Article in a conference publication |
| Event | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics - San Francisco, United States Duration: 24 Jan 2012 → 25 Jan 2012 Conference number: 5 |
Conference
| Conference | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics |
|---|---|
| Country | United States |
| City | San Francisco |
| Period | 24/01/2012 → 25/01/2012 |
Keywords
- Atomic layer deposition
- Bragg mirror
- Fabry-perot interferometer
- Mems
- Spectrometry