@techreport{c591bb3169684d3f8889b52c938b8b70,
title = "Ultrahigh Vacuum Plasma Oxidation in the Fabrication of Ultrathin Silicon Dioxide Films",
keywords = "plasma oxidation, ultrahigh vacuum, ultrathin silicon dioxide, plasma oxidation, ultrahigh vacuum, ultrathin silicon dioxide, plasma oxidation, ultrahigh vacuum, ultrathin silicon dioxide",
author = "Tero Majamaa",
year = "2000",
language = "English",
series = "Reports in Electron Physics",
publisher = "Teknillinen korkeakoulu, Elektronifysiikan laboratorio",
number = "24",
pages = "88",
type = "WorkingPaper",
institution = "Teknillinen korkeakoulu, Elektronifysiikan laboratorio",
}