Tungsten silicide formation from sequentially sputtered tungsten and silicon films

J.M. Molarius; S. Franssila; G. Drozdy; J. Saarilahti

Tungsten silicide formation from sequentially sputtered tungsten and silicon films

J.M. Molarius, S. Franssila, G. Drozdy, J. Saarilahti

School services, ELEC

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Journal	Applied Surface Science
Volume	53
Publication status	Published - 1991
MoE publication type	A1 Journal article-refereed

Keywords

silicon films
sputtered tungsten
tungsten silicide

Cite this

@article{cdcc4f25474647fdbad3a079729e6a39,

title = "Tungsten silicide formation from sequentially sputtered tungsten and silicon films",

keywords = "silicon films, sputtered tungsten, tungsten silicide, silicon films, sputtered tungsten, tungsten silicide, silicon films, sputtered tungsten, tungsten silicide",

author = "J.M. Molarius and S. Franssila and G. Drozdy and J. Saarilahti",

year = "1991",

language = "English",

volume = "53",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier Science B.V.",

}

TY - JOUR

T1 - Tungsten silicide formation from sequentially sputtered tungsten and silicon films

AU - Molarius, J.M.

AU - Franssila, S.

AU - Drozdy, G.

AU - Saarilahti, J.

PY - 1991

Y1 - 1991

KW - silicon films

KW - sputtered tungsten

KW - tungsten silicide

KW - silicon films

KW - sputtered tungsten

KW - tungsten silicide

KW - silicon films

KW - sputtered tungsten

KW - tungsten silicide

M3 - Article

VL - 53

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -