Transition in electron scattering mechanism in atomic layer deposited Nb:TiO2 thin films

Janne-Petteri Niemelä, Y. Hirose, Tetsuya Hasegawa, Maarit Karppinen

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    Abstract

    We characterized transport and optical properties of atomic layer deposited Nb:TiO2 thin films on glass substrates. These promising transparent conducting oxide (TCO) materials show minimum resistivity of 1.0 × 10−3 Ω cm at 300 K and high transmittance in the visible range. Low-temperature (2–300 K) Hall measurements and the Drude fitting of the Vis-NIR optical spectra indicate a transition in the scattering mechanism from grain boundary scattering to intra-grain scattering with increasing Nb content, thus underlining enhancement of the grain size in the low doping regime as the key for further improved TCO properties.
    Original languageEnglish
    Article number042101
    Pages (from-to)1-4
    JournalApplied Physics Letters
    Volume106
    Issue number4
    DOIs
    Publication statusPublished - 2015
    MoE publication typeA1 Journal article-refereed

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