Transition in electron scattering mechanism in atomic layer deposited Nb:TiO2 thin films

Janne-Petteri Niemelä; Y. Hirose; Tetsuya Hasegawa; Maarit Karppinen

doi:10.1063/1.4906865

Transition in electron scattering mechanism in atomic layer deposited Nb:TiO2 thin films

Janne-Petteri Niemelä, Y. Hirose, Tetsuya Hasegawa, Maarit Karppinen

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Abstract

We characterized transport and optical properties of atomic layer deposited Nb:TiO2 thin films on glass substrates. These promising transparent conducting oxide (TCO) materials show minimum resistivity of 1.0 × 10−3 Ω cm at 300 K and high transmittance in the visible range. Low-temperature (2–300 K) Hall measurements and the Drude fitting of the Vis-NIR optical spectra indicate a transition in the scattering mechanism from grain boundary scattering to intra-grain scattering with increasing Nb content, thus underlining enhancement of the grain size in the low doping regime as the key for further improved TCO properties.

Original language	English
Article number	042101
Pages (from-to)	1-4
Journal	Applied Physics Letters
Volume	106
Issue number	4
DOIs	https://doi.org/10.1063/1.4906865
Publication status	Published - 2015
MoE publication type	A1 Journal article-refereed

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10.1063/1.4906865

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Molecular-Layer-Engineered Inorganic-Organic Hybrid Materials
Giedraityte, Z., Marin, G., Mustonen, O., Multia, J., Philip, A., Srivastava, D., Tripathi, T., Jin, H., Khayyami, A., Krahl, F., Safdar, M., Thomas, C., Ahvenniemi, E., Heiska, J., Medina, E., Ghazy, A., Hagen, D., Lepikko, S., Johansson, L., Karppinen, M., Aleksandrova, I., Haggren, A. & Nisula, M.
23/12/2013 → 31/01/2019
Project: EU: ERC grants

Cite this

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title = "Transition in electron scattering mechanism in atomic layer deposited Nb:TiO2 thin films",

abstract = "We characterized transport and optical properties of atomic layer deposited Nb:TiO2 thin films on glass substrates. These promising transparent conducting oxide (TCO) materials show minimum resistivity of 1.0 × 10−3 Ω cm at 300 K and high transmittance in the visible range. Low-temperature (2–300 K) Hall measurements and the Drude fitting of the Vis-NIR optical spectra indicate a transition in the scattering mechanism from grain boundary scattering to intra-grain scattering with increasing Nb content, thus underlining enhancement of the grain size in the low doping regime as the key for further improved TCO properties.",

author = "Janne-Petteri Niemel{\"a} and Y. Hirose and Tetsuya Hasegawa and Maarit Karppinen",

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T1 - Transition in electron scattering mechanism in atomic layer deposited Nb:TiO2 thin films

AU - Niemelä, Janne-Petteri

AU - Hirose, Y.

AU - Hasegawa, Tetsuya

AU - Karppinen, Maarit

N1 - | openaire: EC/FP7/339478/EU//LAYERENG-HYBMAT

PY - 2015

Y1 - 2015

N2 - We characterized transport and optical properties of atomic layer deposited Nb:TiO2 thin films on glass substrates. These promising transparent conducting oxide (TCO) materials show minimum resistivity of 1.0 × 10−3 Ω cm at 300 K and high transmittance in the visible range. Low-temperature (2–300 K) Hall measurements and the Drude fitting of the Vis-NIR optical spectra indicate a transition in the scattering mechanism from grain boundary scattering to intra-grain scattering with increasing Nb content, thus underlining enhancement of the grain size in the low doping regime as the key for further improved TCO properties.

AB - We characterized transport and optical properties of atomic layer deposited Nb:TiO2 thin films on glass substrates. These promising transparent conducting oxide (TCO) materials show minimum resistivity of 1.0 × 10−3 Ω cm at 300 K and high transmittance in the visible range. Low-temperature (2–300 K) Hall measurements and the Drude fitting of the Vis-NIR optical spectra indicate a transition in the scattering mechanism from grain boundary scattering to intra-grain scattering with increasing Nb content, thus underlining enhancement of the grain size in the low doping regime as the key for further improved TCO properties.

U2 - 10.1063/1.4906865

DO - 10.1063/1.4906865

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SP - 1

EP - 4

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 4

M1 - 042101

ER -

Transition in electron scattering mechanism in atomic layer deposited Nb:TiO2 thin films

Abstract

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Molecular-Layer-Engineered Inorganic-Organic Hybrid Materials

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