Total reflection X-ray topography for the observation of misfit dislocation strain at the surface of a Si/Ge-Si heterostructure

P.J. McNally, G. Dilliway, J.M. Bonar, A. Willoughby, T. Tuomi, R. Rantamäki, A.N. Danilewsky, D. Lowney

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageEnglish
    Pages (from-to)121-130
    JournalJournal of X-Ray Science and Technology
    Issue number9
    Publication statusPublished - 2002
    MoE publication typeA1 Journal article-refereed


    • Si-Ge heterostructure
    • synchrotron x-ray topography

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