ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition

Alireza M. Kia*, Nora Haufe, Sajjad Esmaeili, Clemens Mart, Mikko Utriainen, Riikka L. Puurunen, Wenke Weinreich

*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

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