Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

M. Ritala, M. Leskelä, L. Niinistö, P. Haussalo

    Research output: Contribution to journalArticleScientificpeer-review

    254 Citations (Scopus)
    Original languageEnglish
    Pages (from-to)1174-1181
    JournalChemistry of Materials
    Volume5
    Publication statusPublished - 1993
    MoE publication typeA1 Journal article-refereed

    Keywords

    • atomic layer epitaxy (ALE)
    • precursor
    • thin films
    • titanium dioxide

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