Thin films and overlayers by ALE for advanced applications

M. Kröger; T. Leskelä; M. Nieminen; L. Niinistö; E. Nykänen; M. Utriainen

Thin films and overlayers by ALE for advanced applications

M. Kröger, T. Leskelä, M. Nieminen, L. Niinistö, E. Nykänen, M. Utriainen

Research output: Working paper › Professional

Original language	English
Pages	p.
Publication status	Published - 1996
MoE publication type	D4 Published development or research report or study

Publication series

Name	17th Estonian Chemistry Days, Tartto, Viro, 19.-20.4.1996

Keywords

ale
atomic layer epitaxy
characterization
synthesis
thin film

OpenUrl availability

Full text

Cite this

@techreport{99f0cc7db8bd43fe9e0c0bf8d66a438d,

title = "Thin films and overlayers by ALE for advanced applications",

keywords = "ale, atomic layer epitaxy, characterization, synthesis, thin film, ale, atomic layer epitaxy, characterization, synthesis, thin film, ale, atomic layer epitaxy, characterization, synthesis, thin film",

author = "M. Kr{\"o}ger and T. Leskel{\"a} and M. Nieminen and L. Niinist{\"o} and E. Nyk{\"a}nen and M. Utriainen",

year = "1996",

language = "English",

series = "17th Estonian Chemistry Days, Tartto, Viro, 19.-20.4.1996",

pages = "p.",

type = "WorkingPaper",

}

TY - UNPB

T1 - Thin films and overlayers by ALE for advanced applications

AU - Kröger, M.

AU - Leskelä, T.

AU - Nieminen, M.

AU - Niinistö, L.

AU - Nykänen, E.

AU - Utriainen, M.

PY - 1996

Y1 - 1996

KW - ale

KW - atomic layer epitaxy

KW - characterization

KW - synthesis

KW - thin film

KW - ale

KW - atomic layer epitaxy

KW - characterization

KW - synthesis

KW - thin film

KW - ale

KW - atomic layer epitaxy

KW - characterization

KW - synthesis

KW - thin film

M3 - Working paper

T3 - 17th Estonian Chemistry Days, Tartto, Viro, 19.-20.4.1996

SP - p.

BT - Thin films and overlayers by ALE for advanced applications

ER -