Thickness Evaluation of Si/SiO2 Multilayers by Ellipsometry and Reflection Spectrometry

Research output: Working paperProfessional


Research units


Original languageEnglish
Place of PublicationOxford, UK
Publication statusPublished - 2003
MoE publication typeD4 Published development or research report or study

Publication series

NameThe 20th Nordic Semiconductor Meeting, Tampere, Finland, August 25-27
PublisherTampere University of Technology

    Research areas

  • ellipsometry, reflection spectrometry, si/sio2, tem

ID: 4128909