Thermal gas-phase etching of titanium nitride (TiN) by thionyl chloride (SOCl2)

Varun Sharma, Tom Blomberg, Suvi Haukka, Shaun Cembella, MIchael E. Givens, Marko Tuominen, Rajesh Odedra, Wes Graff, Mikko Ritala*

*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

3 Citations (Scopus)
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