Thermal characteristics of silicon nitride membranes at sub-Kelvin temperatures

M. M. Leivo*, J. P. Pekola

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

77 Citations (Scopus)

Abstract

We have performed calorimetric measurements on 200 nm thin silicon nitride membranes at temperatures from 0.07 to 1 K. Besides full windows, membranes cut into a thermally isolating suspended bridge geometry were investigated. Based on dc and ac measurements employing normal-metal/insulator/superconductor (NIS) tunnel junctions both as a thermometer and a heater, we report on heat transport and thermal relaxation in silicon nitride films. The bridge structure improves thermal isolation and, consequently, energy sensitivity by two orders of magnitude over those of the full membrane with the same size, and makes such a structure very attractive for bolometric and microrefrigeration applications.

Original languageEnglish
Pages (from-to)1305-1307
Number of pages3
JournalApplied Physics Letters
Volume72
Issue number11
DOIs
Publication statusPublished - 1998
MoE publication typeA1 Journal article-refereed

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