Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

Varun Sharma*, Tom Blomberg, Suvi Haukka, Michael E. Givens, Marko Tuominen, Mikko Ritala*, Simon Elliott

*Corresponding author for this work

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