Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Research output: Contribution to journalArticle


Research units

  • VTT Technical Research Centre of Finland
  • Beneq Oy
  • University of Jyväskylä
  • Air Products and Chemicals, Inc.


Original languageEnglish
Pages (from-to)93-98
Number of pages6
JournalThin Solid Films
Publication statusPublished - 2 May 2014
MoE publication typeA1 Journal article-refereed

    Research areas

  • atomic layer deposition, batch deposition, conformal coating, plasma-enhanced atomic layer deposition, precursors, silicon dioxide

ID: 896258