Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Matti Putkonen, M. Bosund, Oili M. E. Ylivaara, Riikka Puurunen, L. Kilpi, H. Ronkainen, S. Sintonen, S. Ali, H. Lipsanen, Xuwen Liu, Eero Haimi, Simo-Pekka Hannula, T. Sajavaara, I. Buchanan, E. Karwacki, Mika Vähä-Nissi

Research output: Contribution to journalArticleScientificpeer-review

37 Citations (Scopus)
Original languageEnglish
Pages (from-to)93-98
Number of pages6
JournalThin Solid Films
Volume558
DOIs
Publication statusPublished - 2 May 2014
MoE publication typeA1 Journal article-refereed

Keywords

  • atomic layer deposition
  • batch deposition
  • conformal coating
  • plasma-enhanced atomic layer deposition
  • precursors
  • silicon dioxide
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