Original language | English |
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Pages (from-to) | 93-98 |
Number of pages | 6 |
Journal | Thin Solid Films |
Volume | 558 |
DOIs | |
Publication status | Published - 2 May 2014 |
MoE publication type | A1 Journal article-refereed |
Keywords
- atomic layer deposition
- batch deposition
- conformal coating
- plasma-enhanced atomic layer deposition
- precursors
- silicon dioxide
Equipment
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Raw Materials Research Infrastructure
Karppinen, M. (Manager)
School of Chemical EngineeringFacility/equipment: Facility