The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching Ion Etching

Nikolai Chekurov; Kestutis Grigoras; Antti Peltonen; Sami Franssila; Ilkka Tittonen

The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching Ion Etching

Nikolai Chekurov, Kestutis Grigoras, Antti Peltonen, Sami Franssila, Ilkka Tittonen

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Journal	Nanotechnology
Volume	20
Issue number	6
Publication status	Published - 2009
MoE publication type	A1 Journal article-refereed

Keywords

deep reactive ion etching
Focuse ION Beam
nanofabrication

Cite this

@article{46a5728c884f45c492f4c5c9d9fe19f7,

title = "The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching Ion Etching",

keywords = "deep reactive ion etching, Focuse ION Beam, nanofabrication, deep reactive ion etching, Focuse ION Beam, nanofabrication, deep reactive ion etching, Focuse ION Beam, nanofabrication",

author = "Nikolai Chekurov and Kestutis Grigoras and Antti Peltonen and Sami Franssila and Ilkka Tittonen",

year = "2009",

language = "English",

volume = "20",

journal = "Nanotechnology",

issn = "1361-6528",

publisher = "Institute of Physics Publishing",

number = "6",

}

TY - JOUR

T1 - The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching Ion Etching

AU - Chekurov, Nikolai

AU - Grigoras, Kestutis

AU - Peltonen, Antti

AU - Franssila, Sami

AU - Tittonen, Ilkka

PY - 2009

Y1 - 2009

KW - deep reactive ion etching

KW - Focuse ION Beam

KW - nanofabrication

KW - deep reactive ion etching

KW - Focuse ION Beam

KW - nanofabrication

KW - deep reactive ion etching

KW - Focuse ION Beam

KW - nanofabrication

M3 - Article

SN - 1361-6528

VL - 20

JO - Nanotechnology

JF - Nanotechnology

IS - 6

ER -