The effect of gaseous SiCl4 on ALE growth of CaS, SrS and SrS:Ce

P. Soininen; L. Niinistö; E. Nykänen; M. Leskelä

The effect of gaseous SiCl4 on ALE growth of CaS, SrS and SrS:Ce

P. Soininen, L. Niinistö, E. Nykänen, M. Leskelä

Research output: Contribution to journal › Article › Scientific › peer-review

23 Citations (Scopus)

Original language	English
Pages (from-to)	99-105
Journal	Applied Surface Science
Volume	75
Publication status	Published - 1994
MoE publication type	A1 Journal article-refereed

Keywords

atomic layer epitaxy (ALE)
calcium sulfide
strontium sulfide
thin films

Cite this

@article{2783881697704ef38cb4cb7dbd858f38,

title = "The effect of gaseous SiCl4 on ALE growth of CaS, SrS and SrS:Ce",

keywords = "atomic layer epitaxy (ALE), calcium sulfide, strontium sulfide, thin films, atomic layer epitaxy (ALE), calcium sulfide, strontium sulfide, thin films, atomic layer epitaxy (ALE), calcium sulfide, strontium sulfide, thin films",

author = "P. Soininen and L. Niinist{\"o} and E. Nyk{\"a}nen and M. Leskel{\"a}",

year = "1994",

language = "English",

volume = "75",

pages = "99--105",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier Science B.V.",

}

TY - JOUR

T1 - The effect of gaseous SiCl4 on ALE growth of CaS, SrS and SrS:Ce

AU - Soininen, P.

AU - Niinistö, L.

AU - Nykänen, E.

AU - Leskelä, M.

PY - 1994

Y1 - 1994

KW - atomic layer epitaxy (ALE)

KW - calcium sulfide

KW - strontium sulfide

KW - thin films

KW - atomic layer epitaxy (ALE)

KW - calcium sulfide

KW - strontium sulfide

KW - thin films

KW - atomic layer epitaxy (ALE)

KW - calcium sulfide

KW - strontium sulfide

KW - thin films

M3 - Article

VL - 75

SP - 99

EP - 105

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -