The application of reactive ion etching in producing free‐standing microstructures and its effects on low‐temperature electrical transport

Y. K. Kwong, K. Lin, P. Hakonen, J.M. Parpia, M. Isaacson

Research output: Contribution to journalArticleScientificpeer-review

Original languageEnglish
Pages (from-to)2020-2024
Number of pages5
JournalJournal of Vacuum Science and Technology. Part B.
Issue number6
Publication statusPublished - 1989
MoE publication typeA1 Journal article-refereed
EventInternational Symposium on Electron, Ion, and Photon Beams - Monterey, United States
Duration: 30 May 19892 Jun 1989
Conference number: 33

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