The application of reactive ion etching in producing free‐standing microstructures and its effects on low‐temperature electrical transport

Y. K. Kwong, K. Lin, P. Hakonen, J.M. Parpia, M. Isaacson

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	English
Pages (from-to)	2020-2024
Number of pages	5
Journal	Journal of Vacuum Science and Technology. Part B.
Volume	7
Issue number	6
DOIs	https://doi.org/10.1116/1.584670
Publication status	Published - 1989
MoE publication type	A1 Journal article-refereed
Event	International Symposium on Electron, Ion, and Photon Beams - Monterey, United States Duration: 30 May 1989 → 2 Jun 1989 Conference number: 33

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@article{bac4aac2362446ceae97eb039addace3,

title = "The application of reactive ion etching in producing free‐standing microstructures and its effects on low‐temperature electrical transport",

author = "Kwong, {Y. K.} and K. Lin and P. Hakonen and J.M. Parpia and M. Isaacson",

year = "1989",

doi = "10.1116/1.584670",

language = "English",

volume = "7",

pages = "2020--2024",

journal = "Journal of Vacuum Science and Technology. Part B.",

issn = "1071-1023",

publisher = "American Institute of Physics",

number = "6",

note = "International Symposium on Electron, Ion, and Photon Beams, ISEIPB ; Conference date: 30-05-1989 Through 02-06-1989",

}

TY - JOUR

T1 - The application of reactive ion etching in producing free‐standing microstructures and its effects on low‐temperature electrical transport

AU - Kwong, Y. K.

AU - Lin, K.

AU - Hakonen, P.

AU - Parpia, J.M.

AU - Isaacson, M.

N1 - Conference code: 33

PY - 1989

Y1 - 1989

U2 - 10.1116/1.584670

DO - 10.1116/1.584670

M3 - Article

SN - 1071-1023

VL - 7

SP - 2020

EP - 2024

JO - Journal of Vacuum Science and Technology. Part B.

JF - Journal of Vacuum Science and Technology. Part B.

IS - 6

T2 - International Symposium on Electron, Ion, and Photon Beams

Y2 - 30 May 1989 through 2 June 1989

ER -