Synchrotron x-ray topography and micro-Raman spectroscopy of boron doped silicon wafer using rapid thermal diffusion

M. Nolan, D. Lowney, P.J. McNally, T.S. Perova, A. Moore, H. Gamble, Turkka Tuomi, R. Rantamäki, A.N. Danilewsky

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publication3rd Int. Conf. on Materials for Microelectronics (MFM2000), Dublin Castle, Ireland, 16-17. October, 2000
    Pages147-150
    Publication statusPublished - 2000
    MoE publication typeA4 Article in a conference publication

    Keywords

    • silicon
    • synchrotron x-ray topography

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