Synchrotron X-ray topographic study of strain in silicon wafers with integrated circuits

M. Karilahti, T. Tuomi, M. Taskinen, J. Tulkki, H. Lipsanen, P. McNally

    Research output: Working paperProfessional

    Original languageEnglish
    Place of PublicationPalermo, Italy
    Publication statusPublished - 1996
    MoE publication typeD4 Published development or research report or study

    Publication series

    Name3rd European Symposium on X-ray topography and high resolution diffraction (X-TOP'96), Palermo, Italy, 22-24 April 1996


    • optoelectronics
    • semiconductors

    Cite this