Synchrotron X-ray topographic study of Si wafers and device structures for advanced 0.25 u m and 0.35 u m CMOS technology

P. McNally, A. Reader, T. Tuomi, P. Herbert

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publication3rd European Symposium on X-ray topography and high resolution diffraction (X-TOP'96), Palermo, Italy, 22-24 April 1996
    Place of PublicationPalermo, Italy
    Publication statusPublished - 1996
    MoE publication typeA4 Article in a conference publication


    • optoelectronics
    • semiconductors

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