Synchrotron X-ray topographic study of Si wafers and device structures for advanced 0.25 u m and 0.35 u m CMOS technology

P McNally; A. Reader; T. Tuomi; P. Herbert

Synchrotron X-ray topographic study of Si wafers and device structures for advanced 0.25 u m and 0.35 u m CMOS technology

P McNally, A. Reader, T. Tuomi, P. Herbert

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	EU SHAPE (Sub-Half micron Process for European users) 2nd Process Characterisation Workshop, Centre National d'Etudes des Telecommunications, Grenoble, France, 10-11 January 1996
Place of Publication	Grenoble, France
Publication status	Published - 1996
MoE publication type	A4 Article in a conference publication

Keywords

optoelectronics
semiconductors

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McNally, P ; Reader, A. ; Tuomi, T. et al. / Synchrotron X-ray topographic study of Si wafers and device structures for advanced 0.25 u m and 0.35 u m CMOS technology. EU SHAPE (Sub-Half micron Process for European users) 2nd Process Characterisation Workshop, Centre National d'Etudes des Telecommunications, Grenoble, France, 10-11 January 1996. Grenoble, France, 1996.

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author = "P McNally and A. Reader and T. Tuomi and P. Herbert",

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McNally, P, Reader, A, Tuomi, T & Herbert, P 1996, Synchrotron X-ray topographic study of Si wafers and device structures for advanced 0.25 u m and 0.35 u m CMOS technology. in EU SHAPE (Sub-Half micron Process for European users) 2nd Process Characterisation Workshop, Centre National d'Etudes des Telecommunications, Grenoble, France, 10-11 January 1996. Grenoble, France.

Synchrotron X-ray topographic study of Si wafers and device structures for advanced 0.25 u m and 0.35 u m CMOS technology. / McNally, P; Reader, A.; Tuomi, T. et al.

EU SHAPE (Sub-Half micron Process for European users) 2nd Process Characterisation Workshop, Centre National d'Etudes des Telecommunications, Grenoble, France, 10-11 January 1996. Grenoble, France, 1996.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

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AU - Reader, A.

AU - Tuomi, T.

AU - Herbert, P.

PY - 1996

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KW - semiconductors

KW - optoelectronics

KW - semiconductors

KW - optoelectronics

KW - semiconductors

M3 - Conference contribution

BT - EU SHAPE (Sub-Half micron Process for European users) 2nd Process Characterisation Workshop, Centre National d'Etudes des Telecommunications, Grenoble, France, 10-11 January 1996

CY - Grenoble, France

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