Synchrotron X-ray topographic study of Si wafers and device structures for advanced 0.25 u m and 0.35 u m CMOS technology

P McNally, A. Reader, T. Tuomi, P. Herbert

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationEU SHAPE (Sub-Half micron Process for European users) 2nd Process Characterisation Workshop, Centre National d'Etudes des Telecommunications, Grenoble, France, 10-11 January 1996
    Place of PublicationGrenoble, France
    Publication statusPublished - 1996
    MoE publication typeA4 Article in a conference publication


    • optoelectronics
    • semiconductors

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