Synchrotron topographic studies of various processing steps in the fabrication of semiconductor devices

P. McNally; T. Herbert; T. Tuomi; T. Koljonen; M. Karilahti

Synchrotron topographic studies of various processing steps in the fabrication of semiconductor devices

P. McNally, T. Herbert, T. Tuomi, T. Koljonen, M. Karilahti

Research output: Working paper › Professional

Original language	English
Place of Publication	Espoo
Pages	48-49
Publication status	Published - 1994
MoE publication type	D4 Published development or research report or study

Publication series

Name	Optoelectronics Laboratory, Annual Report 1993
Publisher	TKK
No.	TKK-F-C160

Keywords

synchrotron x-ray topography, semiconductor devices

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Cite this

@techreport{0d6c2976744342cf9a99f1420ea77994,

title = "Synchrotron topographic studies of various processing steps in the fabrication of semiconductor devices",

keywords = "synchrotron x-ray topography, semiconductor devices, synchrotron x-ray topography, semiconductor devices, synchrotron x-ray topography, semiconductor devices",

author = "P. McNally and T. Herbert and T. Tuomi and T. Koljonen and M. Karilahti",

year = "1994",

language = "English",

series = "Optoelectronics Laboratory, Annual Report 1993",

publisher = "TKK",

number = "TKK-F-C160",

pages = "48--49",

type = "WorkingPaper",

institution = "TKK",

}

TY - UNPB

T1 - Synchrotron topographic studies of various processing steps in the fabrication of semiconductor devices

AU - McNally, P.

AU - Herbert, T.

AU - Tuomi, T.

AU - Koljonen, T.

AU - Karilahti, M.

PY - 1994

Y1 - 1994

KW - synchrotron x-ray topography, semiconductor devices

M3 - Working paper

T3 - Optoelectronics Laboratory, Annual Report 1993

SP - 48

EP - 49

BT - Synchrotron topographic studies of various processing steps in the fabrication of semiconductor devices

CY - Espoo

ER -