Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)_(2) (M = Ni, Cu, Pt) precursors

M. Utriainen; M. Kröger-Laukkanen; Leena-Sisko Johansson; Lauri Niinistö

Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)_(2) (M = Ni, Cu, Pt) precursors

M. Utriainen
, M. Kröger-Laukkanen
, Leena-Sisko Johansson
, Lauri Niinistö

Research output: Contribution to journal › Article › Scientific › peer-review

160 Citations (Scopus)

Original language	English
Pages (from-to)	151-158
Journal	Applied Surface Science
Volume	157
Issue number	3
Publication status	Published - 2000
MoE publication type	A1 Journal article-refereed

Keywords

atomic layer epitaxy
beta-diketonate-type precursor
metallic films

Cite this

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title = "Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)\_(2) (M = Ni, Cu, Pt) precursors",

keywords = "atomic layer epitaxy, beta-diketonate-type precursor, metallic films, atomic layer epitaxy, beta-diketonate-type precursor, metallic films, atomic layer epitaxy, beta-diketonate-type precursor, metallic films",

author = "M. Utriainen and M. Kr{\"o}ger-Laukkanen and Leena-Sisko Johansson and Lauri Niinist{\"o}",

year = "2000",

language = "English",

volume = "157",

pages = "151--158",

journal = "Applied Surface Science",

issn = "0169-4332",

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TY - JOUR

T1 - Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)_(2) (M = Ni, Cu, Pt) precursors

AU - Utriainen, M.

AU - Kröger-Laukkanen, M.

AU - Johansson, Leena-Sisko

AU - Niinistö, Lauri

PY - 2000

Y1 - 2000

KW - atomic layer epitaxy

KW - beta-diketonate-type precursor

KW - metallic films

KW - atomic layer epitaxy

KW - beta-diketonate-type precursor

KW - metallic films

KW - atomic layer epitaxy

KW - beta-diketonate-type precursor

KW - metallic films

UR - http://www.elsevier.nl:80/inca/publications/store/5/0/5/6/6/9/

M3 - Article

SN - 0169-4332

VL - 157

SP - 151

EP - 158

JO - Applied Surface Science

JF - Applied Surface Science

IS - 3

ER -

Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)_(2) (M = Ni, Cu, Pt) precursors

Keywords

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