Structural optical and electrical transport properties of ALD-fabricated CuCrO2 films

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We report the structural, optical and electrical transport properties of CuCrO2 films deposited by atomic layer deposition. Copper tetramethyl heptanedionate (Cu(thd)2) and chromium acetyl acetonate (Cr(acac)3) have been used as the precursors for copper and chromium whereas ozone as the oxygen source. The effect of post-deposition annealing on the crystallinity of the films, band gap as well as electrical transport properties has been investigated. A direct band-gap of 3.10 eV was estimated from the UV visible spectrophotometric measurements for the films annealed at 800 0C in Ar environment. Electrical resistivity measurements show a semiconducting behavior. Seebeck coefficient shows an increasing trend with annealing temperature and with temperature sweep measurements.


Original languageEnglish
Pages (from-to)488-494
JournalPhysics Procedia
Publication statusPublished - 2015
MoE publication typeA1 Journal article-refereed
EventInternational Conference on Magnetism - Barceló Congresos Pl. Europa, 17-19 1st floor 08908 L' Hospitalet del Llobregat Barcelona (Spain), Barcelona, Spain
Duration: 5 Jul 201510 Jul 2015
Conference number: 20

    Research areas

  • triangular lattice antiferromagnetism, band-gap, electrical transport, optical properties

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