Stress behaviour of reactively sputtered nitrogenated carbon films

J. Gilvarry; A. Chowdhury; M. Monclus; D. Cameron; P. McNally; T. Tuomi

Stress behaviour of reactively sputtered nitrogenated carbon films

J. Gilvarry
, A. Chowdhury
, M. Monclus
, D. Cameron
, P. McNally
, T. Tuomi

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

1 Citation (Scopus)

Original language	English
Title of host publication	5th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 9-13 September 1996
Place of Publication	Garmisch-Partenkirchen, Germany
Publication status	Published - 1996
MoE publication type	A4 Conference publication

Keywords

optoelectronics
semiconductors

Cite this

@inproceedings{7af936e63cba4aa689fe362cda34cd8a,

title = "Stress behaviour of reactively sputtered nitrogenated carbon films",

keywords = "optoelectronics, semiconductors, optoelectronics, semiconductors, optoelectronics, semiconductors",

author = "J. Gilvarry and A. Chowdhury and M. Monclus and D. Cameron and P. McNally and T. Tuomi",

year = "1996",

language = "English",

booktitle = "5th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 9-13 September 1996",

}

Stress behaviour of reactively sputtered nitrogenated carbon films. / Gilvarry, J.; Chowdhury, A.; Monclus, M. et al.
5th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 9-13 September 1996. Garmisch-Partenkirchen, Germany, 1996.

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Stress behaviour of reactively sputtered nitrogenated carbon films

AU - Gilvarry, J.

AU - Chowdhury, A.

AU - Monclus, M.

AU - Cameron, D.

AU - McNally, P.

AU - Tuomi, T.

PY - 1996

Y1 - 1996

KW - optoelectronics

KW - semiconductors

KW - optoelectronics

KW - semiconductors

KW - optoelectronics

KW - semiconductors

M3 - Conference article in proceedings

BT - 5th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 9-13 September 1996

CY - Garmisch-Partenkirchen, Germany

ER -