Stress behaviour of reactively sputtered nitrogenated carbon films

J. Gilvarry, A. Chowdhury, M. Monclus, D. Cameron, P. McNally, T. Tuomi

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    1 Citation (Scopus)
    Original languageEnglish
    Title of host publication5th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 9-13 September 1996
    Place of PublicationGarmisch-Partenkirchen, Germany
    Publication statusPublished - 1996
    MoE publication typeA4 Article in a conference publication


    • optoelectronics
    • semiconductors

    Cite this