Sticking probabilities of H 2 O and Al(CH 3 ) 3 during atomic layer deposition of Al 2 O 3 extracted from their impact on film conformality

Karsten Arts, Vincent Vandalon, Riikka L. Puurunen, Mikko Utriainen, Feng Gao, Wilhelmus M.M. Erwin Kessels, Harm C.M. Knoops

Research output: Contribution to journal › Article › Scientific › peer-review

36 Citations (Scopus)
324 Downloads (Pure)

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