Stability of the Surface Passivation Properties of Atomic Layer Deposited Aluminum Oxide in Damp Heat Conditions

Research output: Contribution to conferencePosterScientific

Original languageEnglish
Publication statusPublished - Apr 2019
MoE publication typeNot Eligible
EventInternational Conference on Crystalline Silicon Photovoltaics - Leuven, Belgium
Duration: 8 Apr 201910 Apr 2019
Conference number: 9
https://www.siliconpv.com/home/

Conference

ConferenceInternational Conference on Crystalline Silicon Photovoltaics
Abbreviated titleSiliconPV
CountryBelgium
CityLeuven
Period08/04/201910/04/2019
Internet address

Cite this

Heikkinen, I. T. S., Vähänissi, V., & Savin, H. (2019). Stability of the Surface Passivation Properties of Atomic Layer Deposited Aluminum Oxide in Damp Heat Conditions. Poster session presented at International Conference on Crystalline Silicon Photovoltaics, Leuven, Belgium.