Stability of Plasma Oxidized Ultrathin SiO2 Layers in NTP Conditions

T. Majamaa, V-M. Airaksinen

Research output: Working paperProfessional

Original languageEnglish
Publication statusPublished - 1996
MoE publication typeD4 Published development or research report or study

Publication series

Name17th Nordic Semiconductor Meeting, Trondheim, Norway, 17-20.6.1996
PublisherNorwegian Institute of technology

Keywords

  • native oxide
  • ultrathin silicon dioxide

Cite this