Stability of Plasma Oxidized Ultrathin SiO2 Layers in NTP Conditions

T. Majamaa, V-M. Airaksinen, S. Novikov

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{16768d6fd0904383a0a2abf592addc31,

title = "Stability of Plasma Oxidized Ultrathin SiO2 Layers in NTP Conditions",

keywords = "silicon dioxide, ultrathin, silicon dioxide, ultrathin, silicon dioxide, ultrathin",

author = "T. Majamaa and V-M. Airaksinen and S. Novikov",

year = "1997",

language = "English",

volume = "T69",

pages = "215--217",

journal = "Physica Scripta",

issn = "1402-4896",

publisher = "Institute of Physics Publishing",

}

TY - JOUR

T1 - Stability of Plasma Oxidized Ultrathin SiO2 Layers in NTP Conditions

AU - Majamaa, T.

AU - Airaksinen, V-M.

AU - Novikov, S.

PY - 1997

Y1 - 1997

KW - silicon dioxide

KW - ultrathin

KW - silicon dioxide

KW - ultrathin

KW - silicon dioxide

KW - ultrathin

M3 - Article

SN - 1402-4896

VL - T69

SP - 215

EP - 217

JO - Physica Scripta

JF - Physica Scripta

ER -