Stability and Formation Kinetics of TiN and Silicides in the Si3N4-Ti Diffusion Couples

M. Paulasto; F.J.J. van Loo; J.K. Kivilahti

doi:10.1051/jp4:19937167

Stability and Formation Kinetics of TiN and Silicides in the Si3N4-Ti Diffusion Couples

M. Paulasto, F.J.J. van Loo, J.K. Kivilahti

Department of Electrical Engineering and Automation

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Abstract

Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C were studied theoretically as well as experimentally with SEM/EPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria.

Original language	English
Title of host publication	Proceedings of the 3rd European Conference on Advanced Materials and Processes
Publisher	EDP Sciences
Pages	C7: 1069 - 1072
Volume	3
DOIs	https://doi.org/10.1051/jp4:19937167
Publication status	Published - Nov 1993
MoE publication type	A4 Conference publication
Event	European Conference on Advanced Materials and Processes - Paris, France Duration: 8 Jun 1993 → 10 Jun 1993 Conference number: 3

Publication series

Name	Journal de Physique IV
Publisher	EDP SCIENCES
ISSN (Electronic)	1155-4339

Conference

Conference	European Conference on Advanced Materials and Processes
Abbreviated title	EUROMAT
Country/Territory	France
City	Paris
Period	08/06/1993 → 10/06/1993

Access to Document

10.1051/jp4:19937167

Cite this

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title = "Stability and Formation Kinetics of TiN and Silicides in the Si3N4-Ti Diffusion Couples",

abstract = "Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C were studied theoretically as well as experimentally with SEM/EPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria.",

author = "M. Paulasto and \{van Loo\}, F.J.J. and J.K. Kivilahti",

year = "1993",

month = nov,

doi = "10.1051/jp4:19937167",

language = "English",

volume = "3",

series = "Journal de Physique IV",

publisher = "EDP Sciences",

pages = "C7: 1069 -- 1072",

booktitle = "Proceedings of the 3rd European Conference on Advanced Materials and Processes",

address = "France",

note = "European Conference on Advanced Materials and Processes, EUROMAT ; Conference date: 08-06-1993 Through 10-06-1993",

}

Paulasto, M, van Loo, FJJ & Kivilahti, JK 1993, Stability and Formation Kinetics of TiN and Silicides in the Si3N4-Ti Diffusion Couples. in Proceedings of the 3rd European Conference on Advanced Materials and Processes. vol. 3, Journal de Physique IV, EDP Sciences, pp. C7: 1069 - 1072, European Conference on Advanced Materials and Processes, Paris, France, 08/06/1993. https://doi.org/10.1051/jp4:19937167

Stability and Formation Kinetics of TiN and Silicides in the Si3N4-Ti Diffusion Couples. / Paulasto, M.; van Loo, F.J.J.; Kivilahti, J.K.
Proceedings of the 3rd European Conference on Advanced Materials and Processes. Vol. 3 EDP Sciences, 1993. p. C7: 1069 - 1072 (Journal de Physique IV).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Stability and Formation Kinetics of TiN and Silicides in the Si3N4-Ti Diffusion Couples

AU - Paulasto, M.

AU - van Loo, F.J.J.

AU - Kivilahti, J.K.

N1 - Conference code: 3

PY - 1993/11

Y1 - 1993/11

N2 - Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C were studied theoretically as well as experimentally with SEM/EPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria.

AB - Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C were studied theoretically as well as experimentally with SEM/EPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria.

U2 - 10.1051/jp4:19937167

DO - 10.1051/jp4:19937167

M3 - Conference article in proceedings

VL - 3

T3 - Journal de Physique IV

SP - C7: 1069 - 1072

BT - Proceedings of the 3rd European Conference on Advanced Materials and Processes

PB - EDP Sciences

T2 - European Conference on Advanced Materials and Processes

Y2 - 8 June 1993 through 10 June 1993

ER -

Stability and Formation Kinetics of TiN and Silicides in the Si3N4-Ti Diffusion Couples

Abstract

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