Stability and Formation Kinetics of TiN and Silicides in the Si3N4-Ti Diffusion Couples

M. Paulasto, F.J.J. van Loo, J.K. Kivilahti

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Abstract

Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C were studied theoretically as well as experimentally with SEM/EPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria.
Original languageEnglish
Title of host publicationProceedings of the 3rd European Conference on Advanced Materials and Processes
PublisherEDP SCIENCES
PagesC7: 1069 - 1072
Volume3
DOIs
Publication statusPublished - Nov 1993
MoE publication typeA4 Article in a conference publication
EventEuropean Conference on Advanced Materials and Processes - Paris, France
Duration: 8 Jun 199310 Jun 1993
Conference number: 3

Publication series

NameJournal de Physique IV
PublisherEDP SCIENCES
ISSN (Electronic)1155-4339

Conference

ConferenceEuropean Conference on Advanced Materials and Processes
Abbreviated titleEUROMAT
CountryFrance
CityParis
Period08/06/199310/06/1993

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