The spin-reorientation transition of ultrathin Ni films is investigated by means of in situ magneto-optical Kerr imaging as a function of the temperature. A critical thickness dc of about 11.4 monolayers (ML) at T =170 K and 10.3 ML at 370 K has been found. Adsorbates strongly reduce this critical thickness. In particular the adsorption of about 2 langmuir H2 reduces dc to 7 ML at 170 K. The magnetocrystalline anisotropy energy of the clean Ni surface K2s=-153 μeV/atom is strongly reduced by hydrogen adsorption.
|Number of pages||4|
|Journal||Physical Review B (Condensed Matter and Materials Physics)|
|Publication status||Published - Sep 1999|
|MoE publication type||A1 Journal article-refereed|