Spin-reorientation transition in Ni films on Cu(001): The influence of H2 adsorption

R. Vollmer*, Th Gutjahr-Löser, J. Kirschner, S. van Dijken, B. Poelsema

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

98 Citations (Scopus)

Abstract

The spin-reorientation transition of ultrathin Ni films is investigated by means of in situ magneto-optical Kerr imaging as a function of the temperature. A critical thickness dc of about 11.4 monolayers (ML) at T =170 K and 10.3 ML at 370 K has been found. Adsorbates strongly reduce this critical thickness. In particular the adsorption of about 2 langmuir H2 reduces dc to 7 ML at 170 K. The magnetocrystalline anisotropy energy of the clean Ni surface K2s=-153 μeV/atom is strongly reduced by hydrogen adsorption.

Original languageEnglish
Pages (from-to)6277-6280
Number of pages4
JournalPhysical Review B (Condensed Matter and Materials Physics)
Volume60
Issue number9
DOIs
Publication statusPublished - Sep 1999
MoE publication typeA1 Journal article-refereed

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