TY - JOUR
T1 - Simulation of the impact of ionized impurity scattering on the total mobility in si nanowire transistors
AU - Sadi, Toufik
AU - Medina-Bailon, Cristina
AU - Nedjalkov, Mihail
AU - Lee, Jaehyun
AU - Badami, Oves
AU - Berrada, Salim
AU - Carrillo-Nunez, Hamilton
AU - Georgiev, Vihar
AU - Selberherr, Siegfried
AU - Asenov, Asen
N1 - | openaire: EC/H2020/688101/EU//SUPERAID7
PY - 2019/1/2
Y1 - 2019/1/2
N2 - Nanowire transistors (NWTs) are being considered as possible candidates for replacing FinFETs, especially for CMOS scaling beyond the 5-nm node, due to their better electrostatic integrity. Hence, there is an urgent need to develop reliable simulation methods to provide deeper insight into NWTs' physics and operation, and unlock the devices' technological potential. One simulation approach that delivers reliable mobility values at low-field near-equilibrium conditions is the combination of the quantum confinement effects with the semi-classical Boltzmann transport equation, solved within the relaxation time approximation adopting the Kubo-Greenwood (KG) formalism, as implemented in this work. We consider the most relevant scattering mechanisms governing intraband and multi-subband transitions in NWTs, including phonon, surface roughness and ionized impurity scattering, whose rates have been calculated directly from the Fermi's Golden rule. In this paper, we couple multi-slice Poisson-Schrödinger solutions to the KG method to analyze the impact of various scattering mechanisms on the mobility of small diameter nanowire transistors. As demonstrated here, phonon and surface roughness scattering are strong mobility-limiting mechanisms in NWTs. However, scattering from ionized impurities has proved to be another important mobility-limiting mechanism, being mandatory for inclusion when simulating realistic and doped nanostructures, due to the short range Coulomb interaction with the carriers. We also illustrate the impact of the nanowire geometry, highlighting the advantage of using circular over square cross section shapes.
AB - Nanowire transistors (NWTs) are being considered as possible candidates for replacing FinFETs, especially for CMOS scaling beyond the 5-nm node, due to their better electrostatic integrity. Hence, there is an urgent need to develop reliable simulation methods to provide deeper insight into NWTs' physics and operation, and unlock the devices' technological potential. One simulation approach that delivers reliable mobility values at low-field near-equilibrium conditions is the combination of the quantum confinement effects with the semi-classical Boltzmann transport equation, solved within the relaxation time approximation adopting the Kubo-Greenwood (KG) formalism, as implemented in this work. We consider the most relevant scattering mechanisms governing intraband and multi-subband transitions in NWTs, including phonon, surface roughness and ionized impurity scattering, whose rates have been calculated directly from the Fermi's Golden rule. In this paper, we couple multi-slice Poisson-Schrödinger solutions to the KG method to analyze the impact of various scattering mechanisms on the mobility of small diameter nanowire transistors. As demonstrated here, phonon and surface roughness scattering are strong mobility-limiting mechanisms in NWTs. However, scattering from ionized impurities has proved to be another important mobility-limiting mechanism, being mandatory for inclusion when simulating realistic and doped nanostructures, due to the short range Coulomb interaction with the carriers. We also illustrate the impact of the nanowire geometry, highlighting the advantage of using circular over square cross section shapes.
KW - Charge transport
KW - Kubo-Greenwood formalism
KW - Nanowire field-effect transistors
KW - One-dimensional multi-subband scattering models
KW - Schrödinger-poisson solvers
KW - Silicon nanomaterials
UR - http://www.scopus.com/inward/record.url?scp=85059518237&partnerID=8YFLogxK
U2 - 10.3390/ma12010124
DO - 10.3390/ma12010124
M3 - Article
AN - SCOPUS:85059518237
VL - 12
JO - Materials
JF - Materials
SN - 1996-1944
IS - 1
M1 - 124
ER -