Simulation of Conformality of ALD Growth Inside Lateral Channels: Comparison Between a Diffusion-Reaction Model and a Ballistic Model

Jorge A. Velasco, Jänis Järvilehto^*, Jihong Yim, Christine Gonsalves, Emma Verkama, Riikka L. Puurunen

^*Corresponding author for this work

Research output: Contribution to conference › Poster › Scientific › peer-review

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ALDI: Reactive flow in porous media: modelling and experiments in atomic layer deposition context
Puurunen, R., Revitzer, H., Viinikainen, T., Gonsalves, C., Velasco Calsina, J., Yim, J. & Miikkulainen, V.
01/09/2020 → 31/08/2024
Project: Academy of Finland: Other research funding