Simulation of Conformality of ALD Growth Inside Lateral Channels: Comparison Between a Diffusion-Reaction Model and a Ballistic Model

Jorge A. Velasco, Jänis Järvilehto*, Jihong Yim, Christine Gonsalves, Emma Verkama, Riikka L. Puurunen

*Corresponding author for this work

Research output: Contribution to conferencePosterScientificpeer-review

Original languageEnglish
Publication statusPublished - 2022
MoE publication typeNot Eligible
EventInternational Conference on Atomic Layer Deposition - Ghent, Belgium
Duration: 26 Jun 202229 Jun 2022
Conference number: 22


ConferenceInternational Conference on Atomic Layer Deposition
Abbreviated titleALD

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