Projects per year
Atomic layer deposition (ALD) is an advanced industrially feasible technique for fabricating functional materials as high-quality thin films. Here we exploit the technique for the first time for growing thin films of the rare ε-Fe2O3 phase that has been found only in nanoscale samples. This single-metal single-valence oxide is receiving increasing interest due to its unusually high coercivity and multiferroic properties. With ALD, polycrystalline thin films of the ε-Fe2O3 phase are achieved on various substrate surfaces at a relatively low deposition temperature (260-300 °C) from FeCl3 and H2O precursors. The films are ferrimagnetic having an ∼1.6 kOe coercive field.
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- 1 Finished
Mustonen, O., Multia, J., Tripathi, T., Jin, H., Khayyami, A., Thomas, C., Ahvenniemi, E., Heiska, J., Hagen, D., Karppinen, M., Aleksandrova, I., Haggren, A., Nisula, M., Johansson, L., Tiittanen, T., Giedraityte, Z., Krahl, F., Marin, G., Chou, T., Niemelä, J., Ghazy, A., Srivastava, D., Philip, A., Lepikko, S., Safdar, M. & Medina, E.
23/12/2013 → 31/01/2019
Project: EU: ERC grants