Silicon Surface Passivation for Silicon-Colloidal Quantum Dot Heterojunction Photodetectors

Qiwei Xu, I Teng Cheong, Lingju Meng, Jonathan G. C. Veinot, Xihua Wang*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

7 Citations (Scopus)

Abstract

Sensitizing crystalline silicon (c-Si) with an infrared-sensitive material, such as lead sulfide (PbS) colloidal quantum dots (CQDs), provides a straightforward strategy for enhancing the infrared-light sensitivity of a Si-based photodetector. However, it remains challenging to construct a high-efficiency photodetector based upon a Si:CQD heterojunction. Herein, we demonstrate that Si surface passivation is crucial for building a high-performance Si:CQD heterojunction photodetector. We have studied one-step methyl iodine (CH3I) and two-step chlorination/methylation processes for Si surface passivation. Transient photocurrent (TPC) and transient photovoltage (TPV) decay measurements reveal that the two-step passivated Si:CQD interface exhibits fewer trap states and decreased recombination rates. These passivated substrates were incorporated into prototype Si:CQD infrared photodiodes, and the best performance photodiode based upon the two-step passivation shows an external quantum efficiency (EQE) of 31% at 1280 nm, which represents a near 2-fold increase over the standard device based upon the one-step CH3I passivated Si.

Original languageEnglish
Pages (from-to)18429-18436
Number of pages8
JournalACS Nano
Volume15
Issue number11
DOIs
Publication statusPublished - 23 Nov 2021
MoE publication typeA1 Journal article-refereed

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