Silicon nanostructere fabrication by focused ion beam doping and cryogenic deep reactive ion etching

Nikolai Chekurov, Kestutis Grigoras, Antti Peltonen, Sami Franssila, Ilkka Tittonen

    Research output: Working paperProfessional

    Original languageEnglish
    Publication statusPublished - 2009
    MoE publication typeD4 Published development or research report or study

    Publication series

    NameEIPBN 2009, June, Marco Island, USA

    Keywords

    • deep reactive ion etching
    • focuse ion beam
    • nanofabrication

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