Projects per year
Abstract
Compact layers containing embedded semiconductor particles consolidated using pulsed electric current sintering exhibit intense, broadband near-infrared reflectance. The composites consolidated from nano- or micro-silica powder have a different porous microstructure which causes scattering at the air-matrix interface and larger reflectance primarily in the visible region. The 3 mm thick composite compacts reflect up to 72% of the incident radiation in the near-infrared region with a semiconductor microinclusion volume fraction of 1% which closely matches predictions from multiscale Monte Carlo modeling and Kubelka-Munk theory. Further, the calculated spectra predict a reddish tan compact with improved reflectance can be obtained by decreasing the average particle size or broadening the standard deviation. The high reflectance is achieved with minimal dissipative losses and facile manufacturing, and the composites described herein are well-suited to control the radiative transfer of heat in devices at high temperature and under harsh conditions.
Original language | English |
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Pages (from-to) | 16833-16840 |
Number of pages | 8 |
Journal | Ceramics International |
Volume | 47 |
Issue number | 12 |
Early online date | 2021 |
DOIs | |
Publication status | Published - 15 Jun 2021 |
MoE publication type | A1 Journal article-refereed |
Keywords
- A - sintering
- B - composites
- C - optical properties
- D - SiO
Fingerprint
Dive into the research topics of 'Silica-silicon composites for near-infrared reflection: A comprehensive computational and experimental study'. Together they form a unique fingerprint.Projects
- 1 Finished
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Novel measurement and sensing technologies for thermal radiation of unwanted fires
Ala-Nissilä, T. (Principal investigator), Babu, A. (Project Member), Conley, K. (Project Member), Seyedheydari, F. (Project Member) & Vahid, H. (Project Member)
01/01/2018 → 31/12/2021
Project: Academy of Finland: Other research funding
Equipment
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OtaNano - Nanomicroscopy Center
Seitsonen, J. (Manager) & Rissanen, A. (Other)
OtaNanoFacility/equipment: Facility
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