Screening of light impurities in simple metals

M. Manninen; P. Hautojärvi; R NIEMINEN

doi:10.1016/0038-1098(77)90955-3

Screening of light impurities in simple metals

M. Manninen, P. Hautojärvi, R NIEMINEN

Department of Applied Physics

Research output: Contribution to journal › Article › Scientific › peer-review

Abstract

The Kohn-Sham density functional method is used to calculate self-consistent electron densities around H, He and Li impurities in jellium host corresponding to Li, Al and Mg metals. The differences in the density profiles for interstitial and substitutional impurities are investigated. Residual resistivities, relaxation energies and charge transfer in dilute alloys are evaluated.

Original language	English
Pages (from-to)	795-798
Number of pages	4
Journal	Solid State Communications
Volume	23
Issue number	11
DOIs	https://doi.org/10.1016/0038-1098(77)90955-3
Publication status	Published - Sep 1977
MoE publication type	A1 Journal article-refereed

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10.1016/0038-1098(77)90955-3

Cite this

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title = "Screening of light impurities in simple metals",

abstract = "The Kohn-Sham density functional method is used to calculate self-consistent electron densities around H, He and Li impurities in jellium host corresponding to Li, Al and Mg metals. The differences in the density profiles for interstitial and substitutional impurities are investigated. Residual resistivities, relaxation energies and charge transfer in dilute alloys are evaluated.",

author = "M. Manninen and P. Hautoj{\"a}rvi and R NIEMINEN",

year = "1977",

month = sep,

doi = "10.1016/0038-1098(77)90955-3",

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journal = "Solid State Communications",

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T1 - Screening of light impurities in simple metals

AU - Manninen, M.

AU - Hautojärvi, P.

AU - NIEMINEN, R

PY - 1977/9

Y1 - 1977/9

N2 - The Kohn-Sham density functional method is used to calculate self-consistent electron densities around H, He and Li impurities in jellium host corresponding to Li, Al and Mg metals. The differences in the density profiles for interstitial and substitutional impurities are investigated. Residual resistivities, relaxation energies and charge transfer in dilute alloys are evaluated.

AB - The Kohn-Sham density functional method is used to calculate self-consistent electron densities around H, He and Li impurities in jellium host corresponding to Li, Al and Mg metals. The differences in the density profiles for interstitial and substitutional impurities are investigated. Residual resistivities, relaxation energies and charge transfer in dilute alloys are evaluated.

U2 - 10.1016/0038-1098(77)90955-3

DO - 10.1016/0038-1098(77)90955-3

M3 - Article

VL - 23

SP - 795

EP - 798

JO - Solid State Communications

JF - Solid State Communications

SN - 0038-1098

IS - 11

ER -