Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels

Jihong Yim, Oili M.E. Ylivaara, Markku Ylilammi, Virpi Korpelainen, Eero Haimi, Emma Verkama, Mikko Utriainen, Riikka L. Puurunen^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

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ALD Al2O3 thickness profile in microscopic rectangular channel, TMA-water 300 degC 500 cycles, PillarHall(TM) LHAR3-1b, V0001
Ylivaara, O. (Creator), Puurunen, R. (Creator) & Marles, J. (Creator), 31 May 2021
DOI: 10.5281/zenodo.3974438, https://zenodo.org/record/3974438
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