Reply to "Comment on 'Analysis of hydroxyl group controlled atomic layer deposition of hafnium oxide from hafnium tetrachloride and water' " [J. Appl. Phys. 95, 477 (2204)]

Research output: Contribution to journalComment/debateScientificpeer-review

1 Citation (Scopus)

Abstract

This response addresses the comments of Alam and Green [J. Appl. Phys. 98, 016101 (2005)] on my article [J. Appl. Phys. 95, 4777 (2004)]. All comments were related to their model [J. Appl. Phys. 94, 3403 (2003)], which I used as a tool for analyzing the origin of substrate-inhibited growth in atomic layer deposition.
Original languageEnglish
Article number016102
Pages (from-to)1-2
JournalJournal of Applied Physics
Volume98
Issue number1
DOIs
Publication statusPublished - 1 Jul 2005
MoE publication typeA1 Journal article-refereed

Fingerprint

Dive into the research topics of 'Reply to "Comment on 'Analysis of hydroxyl group controlled atomic layer deposition of hafnium oxide from hafnium tetrachloride and water' " [J. Appl. Phys. 95, 477 (2204)]'. Together they form a unique fingerprint.

Cite this