Reliability of Tantalum Based Diffusion Barriers between Copper and Silicon

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Keywords

@inproceedings{208ce5b6a3b243fc82b0da1227e0ee2b,

title = "Reliability of Tantalum Based Diffusion Barriers between Copper and Silicon",

keywords = "diffusion barriers, tantalum, diffusion barriers, tantalum, diffusion barriers, tantalum",

author = "K. Zeng and J.K. Kivilahti and J. Molarius and I. Suni",

year = "2000",

language = "English",

booktitle = "MRS Spring 2000 Meeting, 24-29 April 2000",

publisher = "Materials Research Society",

address = "United States",

}

TY - GEN

T1 - Reliability of Tantalum Based Diffusion Barriers between Copper and Silicon

AU - Zeng, K.

AU - Kivilahti, J.K.

AU - Molarius, J.

AU - Suni, I.

PY - 2000

Y1 - 2000

KW - diffusion barriers

KW - tantalum

KW - diffusion barriers

KW - tantalum

KW - diffusion barriers

KW - tantalum

M3 - Conference article in proceedings

BT - MRS Spring 2000 Meeting, 24-29 April 2000

PB - Materials Research Society

CY - San Francisco

ER -