Reliability of Tantalum Based Diffusion Barriers between Copper and Silicon

K. Zeng, J.K. Kivilahti, J. Molarius, I. Suni

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    Original languageEnglish
    Title of host publicationMRS Spring 2000 Meeting, 24-29 April 2000
    Place of PublicationSan Francisco
    Publication statusPublished - 2000
    MoE publication typeA4 Article in a conference publication


    • diffusion barriers
    • tantalum

    Cite this