Abstract
We report on the reduction of the thermal conductivity in ultra-thin suspended Si membranes with high crystalline quality. A series of membranes with thicknesses ranging from 9 nm to 1.5 μm was investigated using Raman thermometry, a novel contactless technique for thermal conductivity determination. A systematic decrease in the thermal conductivity was observed as reducing the thickness, which is explained using the Fuchs-Sondheimer model through the influence of phonon boundary scattering at the surfaces. The thermal conductivity of the thinnest membrane with d = 9 nm resulted in (9 ± 2) W/mK, thus approaching the amorphous limit but still maintaining a high crystalline quality.
Original language | English |
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Article number | 012113 |
Pages (from-to) | 1-6 |
Journal | APL Materials |
Volume | 2 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2014 |
MoE publication type | A1 Journal article-refereed |