Reducing surface recombination in black silicon photovoltaic devices using atomic layer deposition

Engineering

• Acceptance Angle 5%
• Aluminum 5%
• Applicability 5%
• Applications 11%
• Atomic Layer 22%
• Atomic Layer Deposition 100%
• Boron 11%
• Carrier Lifetime 5%
• Charge Carrier 5%
• Coating 5%
• Conformal Coating 5%
• Contact Solar Cell 11%
• Defect Density 5%
• Deposition Temperature 5%
• Detrimental Effect 5%
• Efficiency 11%
• External Quantum Efficiency 5%
• Fabrication 5%
• Front Surface 5%
• Hafnium 11%
• High Efficiency 11%
• Large Surface 5%
• Lower Surface 5%
• Nanostructured Surface 5%
• Passivation 11%
• Photovoltaics 100%
• Recombination 100%
• Reduction 5%
• Reflectance 11%
• Silicon 94%
• Silicon Solar Cell 100%
• Silicon Surface 5%
• Spectral Range 11%
• Surface Passivation 100%
• Surface Recombination Velocity 5%
• Surfaces 100%
• Thin Film Coating 11%
• Thin Films 5%
• Wavelength 5%

Material Science

• Al2O3 38%
• Aluminum Nitride 5%
• Aluminum Oxide 5%
• Carrier Lifetime 5%
• Cell 5%
• Charge Carrier 5%
• Coating 11%
• Defect Density 5%
• Optical Property 5%
• Optoelectronics 11%
• Oxidant 5%
• Oxide 5%
• Passivation 11%
• Solar Cell 33%
• Surface 100%
• Surface Area 5%
• Temperature 5%
• Thin Films 5%
• Velocity 5%