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Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition
R. L. Puurunen*, A. Häärä, H. Saloniemi, J. Dekker, M. Kainlauri, H. Pohjonen, T. Suni, J. Kiihamäki, E. Santala, M. Leskelä, H. Kattelus
*Corresponding author for this work
Research output: Contribution to journal › Article › Scientific › peer-review
14
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