Abstract
Preparing carbon nanotube (CNT) arrays by plasma enhanced chemical vapor deposition (PECVD) method can dramatically reduce the deposition temperature, which makes it possible for in-situ fabrication of CNT-based nanoelectronic devices. In this paper, up to date research progress of CNT arrays prepared by PECVD method was presented, including radio frequency PECVD, direct current PECVD and microwave PECVD. Then, morphology and quality of CNT arrays were compared. In the end, we analyzed the possible challenges encountered through CNT array preparation by PECVD method at the moment and in the future.
Original language | English |
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Pages (from-to) | 308-314 |
Journal | Materials Science Forum |
Volume | 852 |
DOIs | |
Publication status | Published - Dec 2015 |
MoE publication type | A1 Journal article-refereed |