@techreport{3ac9bb96aeeb4a36b7967ad0f6b59430,
title = "Recent developments in depositing oxide thin films of perovskite-type by atomic layer epitaxy (ALE)",
keywords = "atomic layer epitaxy, oxide, perovskite, thin film, atomic layer epitaxy, oxide, perovskite, thin film, atomic layer epitaxy, oxide, perovskite, thin film",
author = "L. Niinist{\"o} and M. Nieminen and H. M{\"o}ls{\"a} and L.-S. Johansson and E. Rauhala and O. Nilsen and H. Seim and H. Fjellv{\aa}g",
year = "1997",
language = "English",
series = "4th International Workshop on Oxide Electronics, Maryland, USA, December 8-9, 1997",
type = "WorkingPaper",
}